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以TLM钛合金为阳极氧化的基片,通过改变阳极氧化电压、钛合金相结构,找到制备纳米多孔阵列的参数,通过条件试验发现,在恒电压小于30V时,通过时效处理的TLM钛合金表面可以制备得到TiO2纳米多孔结构薄膜。
TLM titanium alloy for the anodized substrate by changing the anodic oxidation voltage, phase structure of titanium alloy to find the preparation of nano-porous array parameters through the condition test found that at a constant voltage of less than 30V, through the aging of TLM titanium alloy surface TiO2 nanostructured films can be prepared.