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Eaton 公司的 ROA400快速退火装置,能用于分立半导体器件离子注入后的退火,该系统使用强光源加热片子,并精确控制高温,减少了掺杂剂的再分布和基本消除了片子沾污和变形。该系统的关键部分是一个旋涡稳定的水壁直流氩弧灯,它能产生很强的光,使片子在
Eaton’s ROA400 Rapid Annealing Unit can be used for annealing of discrete semiconductor devices after ion implantation. The system uses a strong light source to heat the wafer and precisely control the high temperature, reducing the redistribution of dopants and substantially eliminating sheet smear and deformation . The key part of the system is a vortex-stabilized waterwall DC argon arc lamp that produces a strong light that leaves the film in the