论文部分内容阅读
为惯性约束聚变 (ICF)实验中利用光栅分光特性间接探测激光功率研究 ,制备具有高激光损伤阈值的光栅分光ZrO2 薄膜。采用水热法制备纳米ZrO2 溶胶 ,在 80～ 10 0℃下 ,以 2 0m /min速度涂敷制备出厚 1～ 2 μm、折射率为 1 5 7～ 1 70、表面粗糙度 2 3nm、激光损伤阈值为 2 5～ 3 0J/cm2 (1ns ,1 0 6μm)的ZrO2 薄膜。采用Ar+ 激光器双光束干涉曝光技术制备光栅掩膜板 ,光栅周期为 1～ 2 μm ,深度 70～ 10 0nm。通过电镀工艺将光栅结构转移至镍板上 ,经连续模压 ,最终制备出光栅分光ZrO2 薄膜。分析了光栅周期、模压深度及薄膜折射率等因素对光栅一级衍射效率的影响。制备出的光栅分光ZrO2 薄膜有望用于高功率激光测量
In the experiment of inertial confinement fusion (ICF), the laser power was detected indirectly by using the grating spectral characteristics to prepare a grating-split ZrO2 thin film with high laser damage threshold. The hydrothermal method was used to prepare nanometer ZrO2 sol. The nanometer ZrO2 sol was prepared by coating at a temperature of 80 ~ 100 ℃ and a speed of 20 m / min. The surface roughness of the nanometer ZrO2 sol was 1 ~ 2 μm, the refractive index was 15 ~ 70, the surface roughness was 23 nm, ZrO2 thin films with damage threshold of 25 ~ 30 J / cm2 (1ns, 106μm). The grating mask is prepared by Ar + laser dual-beam interference exposure technology. The grating period is 1 ~ 2 μm and the depth is 70 ~ 100 nm. The grating structure is transferred onto the nickel plate through the electroplating process, and the grating-divided ZrO2 film is finally prepared through continuous molding. The effects of grating period, embossed depth and film refractive index on the first-order diffraction efficiency were analyzed. The prepared grating-dispersed ZrO2 film is expected to be used in high-power laser measurement