Cu ion implantation and subsequent rapid annealing at 500℃ in N2 result in low surface resistivity of 1.611 ohm/sq with high mobility of 290 cm2 V-1 S-1 for microcrystalline diamond (MCD) films.Its electrical field emission behavior can be tued on at Eo =2.6 V/μm,attaining a current density of 19.5μA/cm2 at an applied field of 3.5 V/μm.Field emission scanning electron microscopy combined with Raman and x-ray photoelectron microscopy reveal that the formation of Cu nanoparticles in MCD films can catalytically convert the less conducting disorder/a-C phases into graphitic phases and can provoke the formation of nanographite in the films,forming conduction channels for electron transportation.