论文部分内容阅读
一、引言离子注入是一种表面处理新技术,最先应用于半导体材料的掺杂。70年代,人们研究将其用于金属材料的表面改性,发现该技术与常规的整体冶金及扩散渗镀等方法相比有着不受热力学平衡相图、扩散规律限制,节约合金原料及不存在明显界面等优点,因而受到国内外的重视。国外已制出多种商用离子注入机,将该技术用于工业材料处理。国内研究开始较晚,尚未见到实际工业应用。在各种离子的注入中研究最多的是氮离子。氮离
I. Introduction Ion implantation is a new surface treatment technology, first applied to the doping of semiconductor materials. 70s, people study it for the metal surface modification and found that the technology compared with the conventional methods such as overall metallurgy and diffusion infiltration are not thermodynamically balanced phase diagram, diffusion rules, saving alloy materials and non-existent Obvious interface and other advantages, which have been valued at home and abroad. Abroad has made a variety of commercial ion implanters, the technology used in industrial materials processing. Domestic research started late, yet the actual industrial application has not been seen. In a variety of ion implantation is the most studied nitrogen ions. Nitrogen off