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本文介绍利用已建成的双束低能离子束薄膜淀积系统,制备Si、Ge、GaN低温外延膜,Si/CoSi_2/Si多层结构膜,以及金刚石多晶膜。
This paper introduces the fabrication of Si, Ge, GaN low temperature epitaxial films, Si / CoSi2 / Si multilayer films and diamond polycrystalline films by using the established dual-beam low energy ion beam thin film deposition system.