离子镀是在真空条件下,应用气体放电实现镀膜,即在真空室中使气体或被蒸发物质离化,在气体离子或被蒸发物质离子轰击作用的同时把蒸发物或其反应产物蒸镀在基片上。离子镀把辉光放电、等离子体技术与真空蒸发镀膜技术结合在一起,不仅明显地提高了镀层的各种性能,而且大大地扩充了镀膜技术的应用范围。离子镀除兼有真空蒸镀 Ion plating is carried out under vacuum conditions, the use of gas discharge coating, that is, in the vacuum chamber to gas or evaporated material ionization, in the gas ion or the ion bombardment role of the material while evaporating or evaporation of its reaction products On the substrate. Ion plating to glow discharge, plasma technology and vacuum evaporation coating technology combined not only significantly improve the performance of the coating, but also greatly expanded the application of coating technology. Ion plating both vacuum evaporation