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石墨烯作为一种独特的由碳原子组成的单原子层二维材料,自2004年首次在实验中被制备以来,受到了广泛的关注和研究。石墨烯独特的电学、热学和光学等特性,使其在微电子、储能、透明导电电极以及复合材料等领域有着广阔的应用前景。石墨烯在许多领域的应用对其电子结构、电导率以及透光率等性能有着严格的要求,而这些性能与石墨烯的层数紧密相关。因此,精确的控制石墨烯的层数成为十分重要的研究内容。虽然现有报道提出了一些得到确定层数石墨烯的方法,快速可控得到精确层数石墨烯仍然是现阶段石墨烯应用的一大瓶颈。同时,制备图案化石墨烯也是石墨烯应用中亟需解决的问题。激光是目前最前沿的材料加工和制造手段之一,在现代制造业中扮演了重要角色,已成为国际先进制造技术研究的焦点之一。激光的高亮度、高方向性、高单色性以及典型多维性特征和极端工艺参数使其在加工处理石墨烯方面具备独特优势。结合以上研究热点,本论文提出了一种通过激光辐照的方式对石墨烯进行精确的层数控制、图案化和性能调控的新方法。采用连续CO2激光在真空环境下对石墨烯进行辐照,可将原始多层的石墨烯均匀减薄至2层。采用皮秒激光在大气环境下对石墨烯进行扫描处理,实现多层石墨烯的精确减薄,单次加工即可得到所需层数(1层,2层,3层等)的石墨烯而无需重复加工,并通过图案化的减薄处理,可使不同空间区域具备不同的石墨烯层数。采用飞秒激光切割单层以及多层石墨烯,可简单快捷精确地制备出各种形状和尺寸的石墨烯电子元器件结构。与现有的石墨烯减薄和图案化方法相比,本论文所用方法具有加工过程简单、非接触式加工、环境友好、加工效率高以及加工过程柔性等优势,在石墨烯光电子功能器件领域有着广阔的应用前景。
Graphene, as a unique two-dimensional monolayer material composed of carbon atoms, has been widely studied and researched since it was first prepared in experiments in 2004. The unique electrical, thermal and optical properties of graphene make it have broad application prospects in the fields of microelectronics, energy storage, transparent conductive electrodes and composite materials. The application of graphene in many fields has strict requirements on its electronic structure, electrical conductivity and light transmittance, and these properties are closely related to the number of layers of graphene. Therefore, precise control of the graphene layer becomes a very important research. Although some reports have proposed some methods for obtaining graphene layers, it is still a major bottleneck in the application of graphene at this stage to obtain rapidly and accurately graphene layers. Meanwhile, the preparation of patterned graphene is also an urgent problem to be solved in the application of graphene. Laser is one of the most cutting-edge materials processing and manufacturing methods. It plays an important role in modern manufacturing and has become one of the focuses of international advanced manufacturing technology research. The high brightness, high directivity, high monochromaticity, typical multi-dimensional features and extreme process parameters make laser a unique advantage in the processing of graphene. Combined with the above research hot spots, this paper presents a new method of laser grafting graphene precise layer control, patterning and performance control. Using continuous CO2 laser to irradiate graphene in vacuum environment, the original multilayer graphene can be thinned to two layers uniformly. Using picosecond laser to scan the graphene in the atmosphere, the multi-layer graphene can be accurately thinned, and the graphene of the desired number of layers (first layer, second layer, third layer, etc.) can be obtained by a single processing Without repeated processing, and through the patterning thinning process, different spatial regions can have different layers of graphene. The use of femtosecond laser cutting single layer and multilayer graphene, can be simply and quickly and accurately prepared a variety of shapes and sizes of graphene electronic components structure. Compared with the existing graphene thinning and patterning methods, the method used in this paper has the advantages of simple processing, non-contact processing, environment-friendly, high processing efficiency and processing flexibility, etc. In the field of graphene optoelectronic functional devices Broad application prospects.