普通抗蚀剂的氧气灵敏度对工艺设计是一个限制参数,本文叙述了一种新的负性抗蚀剂。各次的接触式曝光由于薄膜的分立区域并不因氧气而产生讨厌的灵敏度降低的反应,所以它就无关紧要。降低氧气灵敏度,并将光谱灵敏度增强至长波。这样使得这种负性抗蚀剂有效用于接 The oxygen sensitivity of conventional resists is a limiting parameter to process design. This article describes a new negative resist. Each contact exposure does not matter because the discrete areas of the film do not produce an objectionable reduced sensitivity to oxygen. Reduce oxygen sensitivity and enhance spectral sensitivity to longer wavelengths. This makes this negative resist effective for connection