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Corning Tropel高级职员说,该公司已制出一种光刻物镜,其分辨率打破以往的记录。 透镜的数值孔径为O.85,可透过紫外光,可以分辨小于70nm的特征,符合下一代光刻的要求。 公司总裁兼首席执行官JohnBruning说,“现今最先进芯片的刻线线宽为130um,而他们的新透镜已可分辨该线宽约一半的尺寸。” 设在英国的微处理专业公司Exitech已将该物镜装入其157nm光刻系统。 Exitech公司技术主任Malcolm Gower说,“在用于高分辨光刻线的物镜中,该透镜的数值
Senior staff at Corning Tropel said the company has produced a lithography objective whose resolution breaks previous records. The numerical aperture of the lens is O.85, it can transmit the ultraviolet light, can distinguish the characteristic smaller than 70nm, accord with the demand of the next generation of lithography. John Bruning, president and chief executive officer of the company, said: “Today’s state-of-the-art chips have a line width of 130um and their new lenses have been able to resolve about half the size of the line.” Exitech, a UK based microprocessing specialist, The objective is loaded into its 157 nm lithography system. Malcolm Gower, technical director at Exitech, said: "In objective lenses for high-resolution lithography, the value of the lens