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利用低温等离子体技术对三氟溴甲烷CF3Br（哈隆1301）进行了降解．在放电3min后，CF3Br（1．3kPa）的降解率可达55％，而在CF3Br（2．0kPa）－O2（2．0kPa）体系中，CF3Br的降解率可达68％．研究了低压CF3Br（在低温等离子体空间中）的气相反应机理，以及CF3Br初始压力、外加气体（氮气、氧气、干空气）对降解CF3Br的影响．这些研究为实现低温等离子体降解污染物提供了有益的信息．
Trifluoromethyl bromide CF3Br (Halon 1301) was degraded using low temperature plasma. After 3 min of discharge, the degradation rate of CF3Br (1.3 kPa) was 55%, while that of CF3Br was 68% in the CF3Br (2.0 kPa) -O2 (2.0 kPa) system. The gas phase reaction mechanism of low pressure CF3Br (in low temperature plasma space) and the effect of CF3Br initial pressure and additional gas (nitrogen, oxygen and dry air) on CF3Br degradation were investigated. These studies provide useful information for achieving low temperature plasma degradation of contaminants.