论文部分内容阅读
面阵红外焦平面结构由于具有体积小、重量轻、功耗低、噪声小、灵敏度和可靠性高等特点而在军事及民用领域获得了应用，国外已有文献报道填充系数为４０％左右的面阵红外焦平面凝视阵列的情况，国内也已制成了填充系数为３５％的面阵肖特基势垒红外焦平面阵列．红外焦平面阵列的红外响应均匀性及空间分辨率和灵敏度是衡量其性能优劣的几项重要指标．通常情况下，空间分辨率的提高可以采取缩小像素面积，增大阵列规模来实现，但像素的减小将导致信号的减弱．为改善具有低填充系数的红外焦平面器件的性能可以采取增大器件的填充系数以获得足够的信噪比的办法进行．利用折射微透镜阵列对入射红外辐射所具有的会聚作用，在维持器件原有暗电流水平不变的基础上，增大器件的填充系数进而提高器件的红外光电响应性能是有效的手段之一．本文给出了利用面阵石英折射微透镜来提高一种国产红外凝视焦平面成像器件的填充系数进而增大其信噪比的方法．折射微透镜的制作方法很多，离子束刻蚀是其中较为实用和可行的技术手段之一．在我们的实验中，与红外焦平面结构匹配的石英折射微透镜阵列的制备利用光刻热熔法及氩离子束刻蚀进行，所制石英折射微透镜分别为矩底拱面形和球冠形．实测表明，所制矩底拱面石英折射微透?
Due to its small size, light weight, low power consumption, low noise, high sensitivity and high reliability, the area infrared focal plane structure has been applied in the military and civil fields. In the past, foreign countries have reported that the filling factor is about 40% Infrared focal plane array staring array situation, the country has also made a fill factor of 35% of the area array Schottky barrier infrared focal plane array. Infrared focal plane array infrared response uniformity and spatial resolution and sensitivity is to measure the performance of several important indicators. In general, the improvement of the spatial resolution can be achieved by reducing the pixel area and increasing the size of the array, but the reduction of the pixel will lead to the signal weakening. To improve the performance of infrared focal plane devices with a low fill factor, a method of increasing the fill factor of the device to obtain a sufficient signal-to-noise ratio can be used. It is an effective way to increase the filling factor of the device and improve the infrared photoelectric response of the device by using the convergent effect of the refractive micro-lens array on the incident infrared radiation while maintaining the original dark current level of the device. In this paper, a method to increase the filling factor of a domestic infrared gaze focal plane imaging device and increase its signal-to-noise ratio by using surface array quartz refraction micro-lens is given. Refractive micro-lens manufacturing methods are many, ion beam etching is one of the more practical and feasible technical means. In our experiment, the preparation of quartz refraction microlens array matched with infrared focal plane structure was carried out by lithography hot-melt method and argon ion beam etching, and the quartz refraction microlens made by them were the bottom arched shape and the spherical cap shape. The measured results show that the bottom of the arch made of quartz refraction micro-transparent?