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本文建立了一个物理模型，编写了数值程序，模拟了微波电子回旋共振（ＥＣＲ）等离子体流的特性。假定等离子体中的电子服从玻尔兹曼关系，离子在从共振区流向衬底的过程中与中性气体发生电荷交换和弹性碰撞。根据等离子体区应满足的电荷准中性条件，采用蒙特卡罗方法可计算出自恰的等离子体电位及离子密度分布。从而分析了磁场形态和气压对等离子体密度空间分布，入射到衬底上的离子通量和平均能量的影响，结果表明：磁场形态和气压都可用来独立控制等离子体流的性能，这对于使用该种等离子体源进行薄膜沉积和刻蚀有一定的理论指导意义。
In this paper, we establish a physical model and write a numerical program to simulate the characteristics of microwave electron cyclotron resonance (ECR) plasma flow. Assuming that the electrons in the plasma follow the Boltzmann relationship, the ions undergo charge exchange and elastic collisions with the neutral gas as they flow from the resonance zone to the substrate. According to the quasi-neutral charge conditions that should be satisfied in the plasma region, the Monte Carlo method can be used to calculate the self-consistent plasma potential and ion density distribution. The influence of the magnetic field morphology and pressure on the plasma density, the ion flux incident on the substrate and the average energy is analyzed. The results show that both the magnetic field shape and the pressure can be used to control the plasma flow independently. The plasma source for film deposition and etching has some theoretical significance.