三氧化二铬(Cr_2O_3)薄膜具有高熔点、高硬度、低摩擦系数和耐磨损等优点,是应用非常广泛的一种薄膜材料。介绍了Cr_2O_3薄膜常用的制备方法,包括化学气相沉积法、蒸发诱导组装法、磁控溅射法、脉冲激光沉积法、分子束外延法等,并进行了比较分析。阐述了Cr_2O_3薄膜在扩散阻挡层、耐磨损保护层、薄膜电阻器件、金属材料保护层、电子开关材料、电极材料、气敏材料等方面的应用。对Cr_2O_3薄膜的制备方法及应用进行了展望。 Cr 2 O 3 film has the advantages of high melting point, high hardness, low friction coefficient and wear resistance. It is a very widely used thin film material. The common preparation methods of Cr 2 O 3 thin films are introduced, including chemical vapor deposition, evaporation-induced assembly, magnetron sputtering, pulsed laser deposition and molecular beam epitaxy. The application of Cr 2 O 3 thin film in diffusion barrier, wear protection layer, thin film resistor, metal material protective layer, electronic switch material, electrode material and gas sensitive material are described. The preparation method and application of Cr 2 O 3 thin film are prospected.