论文部分内容阅读
中微半导体设备公司的核心团队在其领军人物尹志尧博士的带领下,在中国大陆创建中微半导体设备公司,用了短短十年时间,开发了一系列微观加工关键的等离子体刻蚀和化学薄膜设备,以独立自主的创新技术、极高的生产效率、明显的成本优势、一流的产品质量开始进入国内外众多的先进半导体芯片生产线。随着《国家集成电路产业发展推进纲要》的发布,中微和全行业一起迎来一个发展的新机遇。产业基金如果能以股本金、低息贷款和科研资助的方式三管齐下,势必可为中国半导体行业的新一轮发展加快提速。
Under the leadership of its leader, Dr. Yin Zhiyao, the core team of China Micro Devices and Semiconductor Corporation created a micro-semiconductor equipment company in mainland China in just 10 years and developed a series of key plasma etching and chemical Film equipment, with independent innovation, high production efficiency, significant cost advantages, first-class product quality began to enter the domestic and foreign many advanced semiconductor chip production line. With the release of “Outline of National Integrated Circuit Industry Promotion,” China Micro and the whole industry usher in a new opportunity for development. If the three-pronged approach to capital raising, low-interest loans and research funding is available, the industrial funds will surely speed up the pace of the new round of Chinese semiconductor industry development.