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报道了金属与金属氧化物复合靶的射频溅射法，制备Ｂｉ４Ｔｉ３Ｏ（１２）（ＢＴＯ）铁电陶瓷薄膜的方法，研究ＢＴＯ薄膜的晶体结构，表面形貌以及断面．实验表明采用复合靶能够制备质量好、成分均匀的ＢＴＯ薄膜，其结晶取向与基片材料有关，且退火工艺对膜的质量有影响．
A method of preparing the Bi4Ti3O (12) (BTO) ferroelectric ceramic thin film by RF sputtering was reported. The crystal structure, surface morphology and cross section of the BTO thin film were studied. Experiments show that the composite target can be used to prepare BTO films with good quality and uniform composition. The crystal orientations are related to the substrate materials, and the annealing process has an impact on the film quality.