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IBM公司研究人员于1982年首先将准分子激光技术应用在半导体光刻工艺中。此后,逐步商品化的准分子激光技术成功的用在接触式光刻和掩膜制造工艺中。但其最终目标是将这一技术用于分步投影光刻机中,因为它是当前半导体器件制造的关键设备。自从1986年AT&T贝尔实验室报导了他们研制的世界上第一台准分子激光分步投影光刻机之后,许多实验室及光刻机制造厂商开展了这个项目的研究工作。一些厂商开始接受用户订单。准分子激光用于分步投影光刻技术的前景看来是光明的。
IBM researchers in 1982 first excimer laser technology used in semiconductor lithography process. Since then, the progressive commercialization of excimer laser technology is successfully used in contact lithography and mask manufacturing process. But its ultimate goal is to use this technology in a step-and-step projection lithography machine, as it is the key device in today’s semiconductor device manufacturing. Since 1986, AT & T Bell Labs reported that they developed the world’s first excimer laser step projection lithography machine, many laboratory and lithography machine manufacturers to carry out the project research work. Some vendors began to accept user orders. The prospect of using excimer lasers for step-projection lithography seems bright.