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在碱性催化条件下,以正硅酸乙酯为前驱体,制备了一种新的、光谱性能持效的短波长减反膜。溶胶制备中,采用20氟基-1,12-十二醇(PFG)控制了二氧化硅颗粒的结构和尺寸,从而一定程度地减小了薄膜的折射率。以PFG修饰的二氧化硅为基础,再采用甲基丙烯酸六氟丁酯的聚合物(PHFBMA)对溶胶进行改性,得到了适用于熔石英基底的PHFBMA/PFG/SiO2减反膜。该改性减反膜在300 nm左右可以达到99.9%的透过率,并且一定湿度条件下和含有机污染物的真空腔室内的考察结果表明,该改性膜层的透过率稳定性获得了显著提升。
Under alkaline catalysis, a new short wavelength anti-reflection film with a good spectral performance was prepared by using tetraethyl orthosilicate as a precursor. In sol preparation, the structure and size of silica particles were controlled by 20Fluoro-1,12-dodecanol (PFG), which reduced the refractive index of the film to a certain degree. Based on the PFG-modified silica, the polymer was modified with hexafluorobutyl methacrylate (PHFBMA) to obtain a PHFBMA / PFG / SiO2 antireflection film suitable for fused silica substrates. The modified antireflective film can achieve a transmittance of 99.9% at about 300 nm, and the investigation in a vacuum chamber containing organic pollutants under certain humidity shows that the transmittance of the modified film is obtained in a stable manner Significantly improved.