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利用光刻热熔成形工艺及离子束刻蚀制作 12 8× 12 8元凹微透镜阵列。所制硅及石英凹微透镜的典型基本图形分别为凹球冠形、凹柱形和矩顶凹面形。分析了在光致抗蚀剂柱凹微透镜图形制作过程中的膜系匹配特性 ,与制作该种微透镜有关的光掩模版的主要结构参数 ,以及光致抗蚀剂掩模工艺参数的控制依据等。探讨了在凹微透镜器件制作基础上利用成膜工艺开展平面折射微透镜器件制作的问题。采用扫描电子显微镜 (SEM)和表面轮廓仪测试了所制石英凹微透镜阵列的表面微结构形貌。给出了所制石英凹微透镜阵列远场光学特性的测试结果。
A 12 8 × 12 8-element concave micro-lens array was fabricated by lithography hot-melt forming and ion-beam etching. The typical basic figures of the made silicon and quartz concave micro-lens are concave spherical crown, concave cylindrical shape and rectangular concave shape. The matching characteristics of the film system during the fabrication of the photoresist micro concave lens are analyzed. The main structural parameters of the photomask in connection with the manufacturing of the micro lens and the control of the process parameters of the photoresist mask are analyzed Basis and so on. The problems of fabricating planar refraction microlens devices by using film-forming technology are discussed based on fabrication of concave micro-lens devices. The surface micro-structure morphology of the prepared quartz concave micro-lens array was tested by scanning electron microscope (SEM) and surface profiler. The test results of the far-field optical properties of the prepared quartz concave micro-lens array are given.