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本研究采用微波等离子体化学气相沉积法(MWPCVD),以三氯甲基硅烷和氢气为原料,在高纯石墨基片上制备出β-SiC多晶薄膜。随沉积条件不同,其薄膜有黑、灰、黄、褐等4种典型颜色。实验表明,氢气与三氯甲基硅烷的比率是影响薄膜外观颜色的最主要因素。XRD分析表明,黑色薄膜中存在游离碳,黄色及褐色薄膜中含有游离硅,仅灰色薄膜组分较纯。该法制备薄膜生长速度快且晶粒均匀细小。光电子能谱分析发现薄膜表面存在二氧化硅、吸附氧及CHx基团等,这是薄膜制备中的主要杂质。
In this study, β-SiC polycrystalline thin films were prepared on high-purity graphite substrates by microwave plasma chemical vapor deposition (MWPCVD) using trichloromethylsilane and hydrogen as raw materials. With the deposition conditions are different, the film has black, gray, yellow, brown and other four kinds of typical colors. Experiments show that the ratio of hydrogen to trichloromethylsilane is the most important factor affecting the appearance color of the film. XRD analysis showed that there was free carbon in the black film, yellow and brown film containing free silicon, only the gray film components were pure. The method for preparing the film has the advantages of rapid growth and uniform and fine grains. Photoelectron spectroscopy analysis found that the surface of the film silica, adsorbed oxygen and CHx groups, which is the main impurity in the film preparation.