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只要是用细小尺寸的整形离子束去轰击靶物,离子束就可成为一种实现高分辨率微细加工的有效手段。本文首先给出以直径小于1000的聚焦镓离子束以扫描方式进行无掩模微细加工、掺杂和抗蚀剂曝光的结果。其次介绍一种离子束透射掩模。并给出用普通尺寸的150KV 质子束照射这种掩模,在 PMMA 抗蚀剂中得到的曝光结果,从而表明该方法具有对0.6μm 分辨率的掩模图形进行1X 复印的能力。最后讨论了仿模离子束光刻和聚焦离子束光刻的潜力。
Ion beams can be an effective means of achieving high-resolution microfabrication as long as they are bombarded with a shaped plastic beam of small size. In this paper, we first present the results of maskless micromachining, doping and resist exposure with scanning focused Gallium ion beam with diameter less than 1000. Followed by an ion beam transmission mask. The results of exposures obtained in a PMMA resist by irradiating this mask with a 150KV proton beam of a normal size are shown to demonstrate the method’s ability to perform a 1X copy of a 0.6μm resolution mask pattern. Finally, the potential of IMC and FIBR is discussed.