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为了研究纳米结构金属Ti的纳米力学性能,在偏压为0~140 V的范围内,采用磁控溅射方法制备纯钛薄膜。并采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和高分辨率透射电子显微镜(HRTEM)表征钛薄膜的显微组织。结果表明:钛薄膜呈现非晶与纳米晶的混合结构,且晶化程度随着偏压的升高而增大。纳米压痕测试结果表明:钛薄膜的硬度与晶粒尺寸在6~15 nm的范围内符合Hall-Petch关系。但其Hall-Petch关系的斜率与采用其他强烈塑性变形法制备的超细晶纯钛相比,明显偏小,且呈现软化趋势。此外,讨论偏压对钛薄膜生长取向的影响。
In order to study the nanomechanical properties of nanostructured metal Ti, pure titanium films were prepared by magnetron sputtering at a bias voltage of 0 ~ 140 V. The microstructure of titanium films was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The results show that the titanium film has a mixed structure of amorphous and nanocrystalline, and the degree of crystallization increases with the increase of bias voltage. The nanoindentation test results show that the hardness and the grain size of the titanium film conform to the Hall-Petch relationship in the range of 6-15 nm. However, the slope of the Hall-Petch relationship is obviously smaller and softer than that of ultrafine-grained pure titanium prepared by other strong plastic deformation methods. In addition, the effect of bias on the orientation of the titanium thin film is discussed.