电子工业部第四十五研究所的科技人员、工人和干部满怀振兴我国电子工业的雄心壮志,刻苦攻关,在非常艰苦的条件下,经过多年的试制研究,终于研究成功可实用的直接分步曝光新设备。这一科研成果是我国超大规模集成电路工艺设备研究制造工作上的一个重大突破。利用光学曝光技术把中间掩模缩小投影,直接在经过处理的硅片上进行曝光,是七十年代后期首先在美国研制成功的。初期、代表样机是GOA公司的Mann4800DSW系统。这一新技术的出现,加速了VLSI的爱 At the 45th Institute of the Ministry of Electronics Industry, scientists, workers and cadres are full of vigor and vitality to revitalize China’s electronics industry. They work hard to tackle this problem. After years of trial and trial research under very difficult conditions, they have finally studied the successful and practical direct step-by-step Exposure of new equipment. This scientific research is a major breakthrough in the research and manufacturing of VLSI process equipment in China. The use of optical exposure technology to reduce the projection of the reticle, directly on the processed silicon exposure, is the seventies first developed in the United States. Initially, on behalf of the prototype is GOA’s Mann4800DSW system. The emergence of this new technology has accelerated the love of VLSI