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本文提出了用连续电子束对硼离子注入硅后进行退火的实验偿试,分析了连续电子束退火的一些优点,并指出了它在器件制造工艺中应用的可能性。
In this paper, we propose an experimental test to anneal boron after implanting Si by continuous electron beam, analyze some advantages of continuous electron beam annealing, and point out the possibility of its application in the device manufacturing process.