论文部分内容阅读
本文以不同多基因抗性背景的 Ht 等基因系为材料,采用双因子互作试验设计,从病斑数,病斑大小和单位面积产孢量的角度,研究了单基因抗性与多基因抗性的交互作用。结果表明,在上述三个方面,两种抗性的互作效应不同程度的存在。在病斑数方面,Ht 基因表现了增加病斑数的效应,但在高抗的多基因背景中这种效应并不明显。就病斑大小而言。背景基因型通过修饰基因或微效多基因影响了抗病单基因的表达。单基因抗性与高抗多基因背景相结合的组合在病斑数、病斑大小和单位面积产孢量方面均表现了显著的抗病作用。
In this paper, Ht and other lines with different multi-gene resistance backgrounds were used as materials. The two-factor interaction design was used to study the relationship between single gene resistance and multiple genes in terms of lesion number, lesion size and sporulation per unit area Resistant interaction. The results show that in the above three aspects, the interaction effects of the two resistances exist to some extent. In terms of the number of plaques, the Ht gene shows an effect of increasing the number of plaques, but this effect is not obvious in the high-resistance polygenic background. In terms of lesion size. Background genotypes affected the expression of a single disease-resistance gene by modifying genes or minor multi-genes. The combination of monogenic and highly resistant polygenic backgrounds showed significant disease resistance in terms of the number of lesions, the size of the lesion and the amount of sporulation per unit area.