光掩模的缺陷形状,虽然一般可用与参考图案比较的方法检查出来,但也可通过其不规则的边缘更迅速地鉴别出来。这种观察法有适合于计算机化的优点,基于激光器的系统既可以检验又可以修正薄膜混合电路用的光掩模,它仅需要以前光靠技术人员的时间的20%。由贝耳电话实验室研制的这种系统利用了这样一种事实:即从缺陷的凹凸不平的边 The defect shape of a photomask, although generally detectable by comparison with a reference pattern, can also be identified more quickly by its irregular edges. This observation has the advantage of being suitable for computerization. Laser based systems can both test and correct photomasks for thin film hybrid circuits, requiring only 20% of the technician’s time. This system, developed by Bell Telephone Laboratory, takes advantage of the fact that from the bumpy edge of the defect