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分析了ＰＩＶ采样底片多次曝光时粒子衍射调制作用对干涉条纹位置的影响，推导出条纹偏移量与曝光次数和粒子相对位移量的关系。分析结果得到了实验的证明．
The influence of the particle diffraction modulation on the position of the interference fringes during the multi-exposure of the PIV sample film is analyzed. The relationship between the fringe offset and the exposure times and the relative displacement of the particles is deduced. The results of the experiment have been proved.