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当注入功率较高时,大间隙速调管输入腔的基频电流分布中,除常规意义上的最佳群聚电流峰值(第一峰值电流)外,出现了与第一峰值电流幅值相当的第二峰值电流.结合群聚理论和粒子模拟结果,研究和讨论了第二峰值电流产生的机理.研究结果表明,第二峰值电流的出现由高电压调制系数下出现的多重电子超越效应造成.当二极管电压600kV,束流5kA,工作频率3.6GHz时,利用多重超越效应可在保持最佳群聚距离基本不变的前提下,把大间隙速调管的束流群聚深度由80%提高到92%,群聚束流的基频功率也从2.2GW提高到2.8GW,增幅约27%.
When the injection power is high, the fundamental current distribution in the input cavity of the large-klysis tube exhibits the same amplitude as that of the first peak current except for the peak of the optimum cluster current (the first peak current) in the conventional sense The second peak current is studied.The mechanism of the second peak current generation is studied and discussed based on the theory of cluster and particle simulation.The results show that the occurrence of the second peak current is caused by the multiple electron surpassing effect at high voltage modulation coefficient When the diode voltage is 600kV, the beam current is 5kA and the operating frequency is 3.6GHz, the multiunit effect can keep the optimal cluster distance substantially unchanged, and the beam cluster depth of the large klystron tube increases from 80% To 92%, the fundamental frequency of the cluster beam increased from 2.2GW to 2.8GW, an increase of about 27%.