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利用基于Mott散射截面和介电函数模型的Monte Carlo方法模拟了电子穿透掩膜的能量损失分布,其计算结果与实验结果符合很好.由此进一步计算了角度限制投影电子束光刻(SCALPEL)掩膜的穿透率和衬度,结果表明:散射体的厚度对衬度的影响较大,衬度随散射体厚度的增加而增强,而支撑体对衬度的影响较小;增大限制孔的孔径角时,透射率相应增大,但衬度会降低;衬度随入射电子的能量增加而减小.
The Monte Carlo method based on the Mott scattering cross section and the dielectric function model was used to simulate the energy loss distribution of the electron penetrating mask, and the calculated results are in good agreement with the experimental results. Then the angle-limited projection electron beam lithography (SCALPEL) ) Mask transmittance and contrast, the results show that: the thickness of the scattering body has a greater impact on the contrast, the contrast increases with the increase of the thickness of the scatterer, while the support has little effect on the contrast; When the aperture angle of the hole is limited, the transmittance increases correspondingly, but the contrast decreases. The contrast decreases with the increase of incident electron energy.