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1.概述硬质材料沉积处理的方法,大致可分为:由W.Ruppt等开发并已在工业中应用的化学气相沉积法(CVD),由Mattox、Buns-bah等开发的物理气相沉积法(PVD),以及由日本丰田汽车公司开发的熔盐浸镀法(TD法)。 CVD起始于19世纪末,先后用于Ti、Zr等金属的提纯以及金属丝、板的耐磨、耐热表面保护。本世纪50年代西德化学气相沉积TiC的成功,使此项技术达到了实用阶段。继之又发展了PVD。1963年Mattox开发了离子镀,1972年Bunshah开发了活性反应蒸镀(ARE),之后又相继出现了各种形式的反应性PVD。为了降低沉积温度,在CVD中又采用了等离子活化以及中温CVD。
1. Overview A method of hard material deposition treatment can be broadly classified into chemical vapor deposition (CVD) developed by W. Ruppt et al. And used in industry, physical vapor deposition method developed by Mattox, Buns-bah et al. (PVD) and molten salt immersion plating (TD method) developed by Japan’s Toyota Motor Corporation. CVD began in the late 19th century, has been used for purification of metals such as Ti, Zr and wire, board wear-resistant, heat-resistant surface protection. The success of TiC CVD TiC in the 1950s brought this technology to practical use. Followed by the development of the PVD. Mattox developed ion plating in 1963, and in 1972 Bunshah developed reactive vapor deposition (ARE), followed by successive forms of reactive PVD. In order to reduce the deposition temperature, plasma activation and medium temperature CVD have been used.