在某基体的表面,真空蒸镀一层其它材料的薄膜,用离子轰击时将引起原子级联碰撞而导致基体原子和薄层原子的混合,特别是在界面区域的混合。所谓反冲注入是指薄层原子在此过程中进入基体的现象。目前,离子束混合已开始应用到半导体器件及金属等材料改性的领域中。 On the surface of a substrate, a thin film of other material is vacuum-evaporated, and bombardment with ions causes the atomic cascade to collide resulting in a mixture of matrix atoms and thin-layer atoms, especially in the interface region. The so-called recoil injection refers to the phenomenon of thin-layer atoms in the process of entering the matrix. At present, ion beam mixing has been applied to the field of semiconductor devices and materials modification of metals.