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研制了一种由多个空心阴极并列组合而成的，可直接作为溅射靶的多重空心阴极溅射靶，其溅射输出量可用电压、气压及空心阴极的高度和宽度比控制由W、Mo合金制成的多重空心阴极溅射靶所做的合金涂镀试验表明，这种方法涂层沉积速度快，涂层致密并与基体结合良好，适用于多种金属或其合金的溅射沉积，尤其是高熔点金属的溅射沉积．
A multi-hollow cathode sputtering target which can be directly used as a sputtering target is developed by the parallel combination of a plurality of hollow cathodes. The sputtering output can be controlled by the ratio of the voltage, the air pressure and the height and width of the hollow cathode, Mo alloy made of multiple hollow cathode sputtering target alloy coating experiments show that this method coating deposition speed, dense coating and good combination with the matrix, suitable for a variety of metals or their alloys sputtering deposition , Especially sputter deposition of high melting point metals.