论文部分内容阅读
在大型薄膜生产设备中，膜厚的横向均匀性是一项重要指标。本文提出用ＭｏｎｔｅＣａｒｌｏ 方法模拟大型磁控溅射器膜厚横向分布的计算方法，计算了靶的几何结构及各种溅射参数对膜厚横向分布的影响，并把计算结果与实际测量进行了比较。
In large-scale film production equipment, the lateral uniformity of film thickness is an important indicator. This paper proposes Monte-Carlo method to simulate the large-scale magnetron sputtering film thickness distribution calculation method, the target geometry and various sputtering parameters on the film thickness distribution is calculated, and the calculation results with the actual measurement A