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叙述了Schwarzschild型正入射软X射线多层膜显微成像系统的设计、制作和成像实验，其工作波长为18．2nm，放大倍数为10．5×，极限分辨率小于0．2μm。采用Mo／Si多层膜，周期和层数分别为9．5nm和41。用激光等离子体光源对20pl／mm和55pl／mm的栅网进行了软X射线显微成像实验，所得结果表明此显微成像系统的分辨率在微米量级。
The design, fabrication and imaging experiments of the Schwarzschild type normal-incidence soft X-ray multilayer micro-imaging system are described. The working wavelength is 18.2nm, the magnification is 10.5 × and the limit resolution is less than 0.2μm. Using Mo / Si multilayer film, the periodicity and the number of layers are 9.5nm and 41 respectively. Soft X-ray microscopy experiments were performed on 20pl / mm and 55pl / mm grids using a laser plasma source. The results show that the resolution of this microscopic imaging system is in the micrometer range.