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电子束蒸发的单层光学薄膜具有明显的柱状结构,薄膜内部折射率的变化较大,由此引起的体散射现象也较明显。基于一阶电磁微扰理论,建立了单层光学薄膜的体散射理论模型,分析了膜层厚度、入射光偏振态、柱状结构因子、非均质性对体散射的影响。研究了纯柱状结构下,电子束蒸发的单层二氧化铪(Hf O2)薄膜体散射的角分布散射值(ARS)随着膜层厚度的变化规律,结果表明纯柱状结构Hf O2薄膜体散射的ARS量级与表面散射完全非相关模型的ARS值相近,并且在特定的膜厚范围内,体散射的ARS值随着膜厚的增大而增大。对于非均质性薄膜,当非均质性一定时,体散射的ARS值随着膜厚的增大而增大;当膜层厚度一定时,体散射的ARS值随着非均质性绝对值的增大而减小。
E-beam evaporation of the single-layer optical film has a clear columnar structure, the refractive index changes within the larger film, the resulting body scattering phenomenon is also more obvious. Based on the first-order EM perturbation theory, a theoretical model for bulk scattering of single-layer optical thin films was established. The effects of film thickness, polarization state of incident light, columnar structure factor and heterogeneity on bulk scattering were analyzed. The angular distribution scattering (ARS) of single-layer hafnium oxide (Hf O2) thin film with electron beam evaporation under pure columnar structure was studied with the variation of film thickness. The results show that the Hf O2 thin film bulk scattering The ARS values of the non-correlated surface scattering model are similar to those of the non-correlated surface scattering model, and the volumetric ARS values increase with the increase of film thickness in the range of specific film thickness. For heterogeneous films, the ARS value of bulk scattering increases with film thickness when the heterogeneity is constant, and the ARS value of bulk scattering increases with the increase of film thickness. The value increases and decreases.