A three-sidewalls-prism holographic method has been provided for the fabrication of 3-D fcc-type polymeric photonic crystal using negative photoresist. Special fabrication treatment has been introduced to ensure the stability of the fabricated nanostructures. The scanning electronic microscopy (SEM) and the diffraction results testified the good dependability of the fabricated structures. The simulation of the partial band structure is in good agreement with the transmission and reflection spectra obtained by Fourier transform infrared spectroscopy. A three-sidewalls-prism holographic method has been provided for the fabrication of 3-D fcc-type polymeric photonic crystal using negative photoresist. Special fabrication treatment has been to assure the stability of the fabricated nanostructures. The scanning electronic microscopy (SEM) and the diffraction results testified the good dependability of the fabricated structures. The simulation of the partial band structure is in good agreement with the transmission and reflection spectra obtained by Fourier transform infrared spectroscopy.