采用磁控溅射法在玻璃基底上制备了Cr-Cu-Al-Cr薄膜,用焊接法测试薄膜附着性能,用x射线衍射仪(XRD)、原子力显微镜(AFM)和台阶仪对薄膜进行表征,研究溅射过程中以及在高温大气环境下薄膜的防氧化方法,分析薄膜晶粒大小与电性能关系,制备出性能较好的导电膜。 Cr-Cu-Al-Cr films were prepared on glass substrates by magnetron sputtering. The films were tested for their adhesion by a welding method. The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) , To study the anti-oxidation method of thin films during sputtering and in high temperature atmosphere, and to analyze the relationship between the film grain size and the electrical properties to prepare a conductive film with better performance.