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在点衍射干涉仪中小孔掩模的主要作用是通过衍射产生接近理想的球面波用于干涉测量,其直径、圆度及三维形貌对测量精度有决定性影响。介绍了小孔掩模的结构与作用原理,对小孔衍射电磁场仿真技术进行了分类比较。对国内外现有小孔掩模加工技术的发展进行了归纳总结,阐述了聚焦离子束刻蚀、电子束曝光等加工技术的加工原理、加工精度及技术特点,指出了掩模对准精度对测量重复性的影响。分析了各种检测方法及存在的主要技术问题,并对小孔三维形貌的测量技术进行了展望。
In the point diffraction interferometer, the main function of the aperture mask is to produce nearly ideal spherical waves by diffraction for interferometry, whose diameter, roundness and three-dimensional topography have a decisive influence on the measurement accuracy. The structure and principle of pinhole mask are introduced, and the comparison of pinhole diffraction electromagnetic field simulation technology is carried out. At the same time, the development of processing technology of small hole mask at home and abroad are summarized. The processing principle, processing precision and technical characteristics of focusing ion beam etching, electron beam exposure and other processing technologies are expounded. The precision of mask alignment Measure the effect of repeatability. Various detection methods and the main technical problems are analyzed, and the prospect of the measurement technique of the three-dimensional topography of the pinhole is prospected.