高纯SiCl_4是制备光导纤维的重要材料。SiCl_4的分析通常采用水解法:将SiCl_4水解后加入氢氟酸,以SiF_4形式挥发基体。该法因使用试剂多,空白值高,在高纯分析中已被低温挥发法所代替。低温挥发法是将盛有SiCl_4坩埚放在电热板上低温(约50℃),挥发SiCl_4,或在低温下通入经过净化和干燥的氮气挥发基体,用酸溶解残渣,然 High purity SiCl 4 is an important material for preparing optical fiber. SiCl_4 analysis is usually used hydrolysis: Hydrolysis of SiCl_4 hydrofluoric acid to SiF_4 form matrix volatilization. The law due to the use of reagents, a high blank value, high-purity analysis has been replaced by low-temperature evaporation method. Low temperature evaporation method is to hold the SiCl_4 crucible placed on a hot plate at low temperature (about 50 ℃), volatile SiCl_4, or at low temperatures through the purification and drying of nitrogen volatilized matrix dissolved residue with acid