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利用离子束增强沉积（ＩＢＥＤ）技术制备了Ｃｒ－Ｎ薄膜，并对不同能量氮离子轰击所制备的薄膜组成进行了Ｘ射线衍射及光电子能谱分析，测定了涂层的断裂韧性值，并对涂层的摩擦学性能进行了研究．结果表明：在相同试验条件下，氮离子轰击能量影响Ｃｒ－Ｎ薄膜的相组成及取向，采用低能量氮离子轰击所得到的薄膜具有较高的断裂韧性和优异的耐磨性能．
Cr-N thin films were prepared by ion beam enhanced deposition (IBED) technique. X-ray diffraction and photoelectron spectroscopy analysis of thin films prepared by bombardment of different energy nitrogen ions were carried out. The fracture toughness The tribological properties of the coatings were investigated. The results show that under the same experimental conditions, the nitrogen ion bombardment energy affects the phase composition and orientation of the Cr-N thin film. The films obtained by low-energy nitrogen ion bombardment have high fracture toughness and excellent wear resistance.