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一、概述 在以往的集成电路的生产中,尤其是在中、大规模集成电路的试制中,深深感到高质量光刻掩模的需要。举例说:在多层布线工艺试验工作中,目前最难于解决的问题莫过于光刻中所产生的针孔,而针孔的产生,掩模的质量是问题的主要方面之一。在中、大规模集成电路的试制中,由于芯片的集成度提高,芯片尺寸增加,掩模图形质量对电路成品率产生巨大影响,不解决掩模质量问题,中、大规模电路的批量生产看来是困难的。由于生产和科研工作开展的实际需要,促使我们开展了选择性透光掩模(即彩色版)的试制。 选择性透光掩模之所以受人注意,主要是它们具有以下几方面优点: a.具有选择性透光,便于光刻时图形套准,而且不必在掩模上作对准标记。 b.光反射率低,改善了边缘锐度,提高了分辨率,有利于细线条光刻。光反射率低,使光刻操作者眼睛不致疲劳。 c.透光掩模本身具有优良的薄膜特性,如针孔密度小,粘附性好,耐划伤等。 目前,一般认为具有代表性的有发展前途的透光掩模大致有三种:即硅、氧化铬和氧化铁。硅掩模是一种相当出色的掩模。据称硅掩模针孔密度最小,可认为无针孔
I. Overview In the past, the production of integrated circuits, especially in the trial of large-scale integrated circuits, deeply felt the need for high-quality lithography mask. For example, in the multilayer wiring test work, the most difficult problem to be solved at present is the pinhole generated in the lithography. The pinhole generation and the quality of the mask are one of the main problems. In the trial of large-scale integrated circuits, due to the increased chip integration, chip size increases, the quality of the mask pattern has a huge impact on the yield of the circuit, does not solve the problem of masking quality, the mass production of large-scale circuit It is difficult. Due to the actual needs of production and scientific research, prompting us to carry out the selective transmission mask (ie color version) trial. The reason why the selective light-transmitting masks are notable is that they have the following advantages: a. They are selectively light-permeable for pattern registration when lithography, and do not have to be aligned on the mask. b. low light reflectivity, improved edge sharpness, increased resolution, is conducive to thin line lithography. Low light reflectivity, lithography operator's eyes will not be tired. c. Transparent mask itself has excellent film properties, such as pinhole density, good adhesion, scratch resistance and so on. At present, there are generally considered as a promising translucent mask roughly three: the silicon, chromium oxide and iron oxide. Silicon mask is a very good mask. Allegedly the smallest silicon pinhole density, can be considered without pinhole