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探索利用反应离子刻蚀 ( RIE)和湿法腐蚀 Si1-x Gex 合金材料的工艺条件。对两种腐蚀方法的利弊进行了对比 ,找出腐蚀 Si1-x Gex 合金材料的实用化途径 ,并且解决了不同 Ge含量的 Si1-x Gex 合金材料的腐蚀速度控制
To explore the reactive ion etching (RIE) and wet etching Si1-xGex alloy material process conditions. The pros and cons of the two corrosion methods are compared to find practical ways to etch Si1-x Gex alloy materials and solve the corrosion rate control of Si1-x Gex alloy materials with different Ge contents