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现代扫描电子束曝光机中,能使靶上束斑形状和尺寸改变的方式最有发展前途和具有高效的生产能力。然而,除开各种技术原因之外,电子光学的限制,也密切影响着可变束曝光机的工作效率。首先是因为一般阴极的最大发射电流都较小;其次,到达靶上的成形束流,只是全部阴极电流的很少一部分。因此,需要对成形束斑中的束流提出某些原则性的约制,以同时满足下述两点要求:
Modern scanning electron beam lithography, the beam spot on the target shape and size can change the most promising way and has an efficient production capacity. However, in addition to various technical reasons, the limitation of electro-optic has a close impact on the work efficiency of the variable beam exposure machine. The first is because the cathode generally has a smaller maximum emission current. Second, the shaped beam reaching the target is only a fraction of the total cathode current. Therefore, some principled constraints on the beam currents in the forming beam spot are required to satisfy both of the following two requirements: