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The large refractive index difference between Si and SiO2 makes it possible to realize ultrasmall photonic integrated circuits. A 5×5 ultracompact arrayed waveguide grating multiplexer based on 500×250 nm Si nanowire waveguides is designed and fabricated by using the technologies of E-beam writing and amorphous-Si deposition. The mea- sured channel spacing is about 1.5 nm (close to the design value) and the channel crosstalk is about –8 dB.
The large refractive index difference between Si and SiO2 makes it possible to realize ultrasmall photonic integrated circuits. A 5 × 5 ultracompact arrayed waveguide grating multiplexer based on 500 × 250 nm Si nanowire waveguides is designed and fabricated by using the technologies of E-beam writing and amorphous-Si deposition. The mea- sured channel spacing is about 1.5 nm (close to the design value) and the channel crosstalk is about -8 dB.