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电子枪蒸发制备了氧化铪薄膜,对氧离子束辅助和未辅助两种情况下的样品进行了折射率、吸收、激光损伤阈值等属性的测试,结果表明,氧离子束辅助沉积的样品与未辅助沉积的样品相比具有高的折射率和高的吸收,以及稍低的激光损伤阈值。经过分析发现,薄膜的激光损伤阈值是影响薄膜抗激光特性的不利因素和有利因素竞争的结果,离子束辅助沉积技术在引入结构致密等有利因素的同时,也引入了吸收增加等不利因素。
The hafnium oxide thin films were prepared by electron gun evaporation. The properties of the samples such as refractive index, absorption and laser damage threshold were tested under oxygen ion beam assisted and unassisted conditions. The results showed that the oxygen ion beam assisted deposition samples The deposited samples have high refractive index and high absorption as well as slightly lower laser damage threshold. After analysis, it is found that the laser damage threshold of the film is the unfavorable factor and the competitive factor that affect the anti-laser characteristics of the film. The ion beam assisted deposition technology introduces the unfavorable factors such as the increase of the absorption while introducing favorable factors such as compact structure.