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提出一种分析线性偏振照明条件下投影物镜偏振像差对交替相移掩模(Alt-PSM)空间像影响的解析方法。基于矢量光刻成像理论,从掩模空间像的光强分布推导出偏振像差引起的空间像图形位置偏移误差(IPE)和最佳焦面偏移(BFS)的解析表达式,实现了各个泡利-泽尼克偏振像差对空间像影响的解析分析。建立了IPE与奇像差项泡利-泽尼克系数和BFS与偶像差项泡利-泽尼克系数间的线性关系。通过光刻仿真软件模拟验证了解析分析结果的正确性,并用最小二乘法评估了线性关系的精确度。
This paper presents an analytical method to analyze the influence of the polarization aberration of projection lens on the space image of Alternating Phase Shift Mask (Alt-PSM) under linear polarization illumination. Based on the theory of vector photolithography, the analytic expressions of the position error (IPE) and the optimal focal offset (BFS) of the spatial image caused by the polarization aberration are deduced from the light intensity distribution of the mask image. Analytical Analysis of the Influence of Each Pauli - Zernike Polarization on the Spatial Image. The linear relationship between the IPE and the odd-difference Pauli-Zernike coefficients and the BFS and the idol difference bubble-Zernike coefficients is established. The correctness of the analytical results was verified by photolithography simulation software, and the linear relationship was evaluated by least square method.