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本文研究了X~(-1),Ac~(-1),NO_3~-1,C_2H_5OH等溶液对苯乙烯磺酸树脂的保护作用,其抑制磺酸基辐射水解的顺序为NO_3~1>C_2_5OH>Ac~(-1)>C1~(-1),Br~(-1)>Ⅰ~(-1)。溶液酸度显著影响卤素离子对磺酸树脂的保护效应,在酸性介质中Ⅰ~-几能全部抑制水对树脂的附加辐解,但在中性溶液中,Ⅰ~(-1)只有相当小的抑制作用,且顺序为Br~(-1),Cl~(-1)>Ⅰ~(-1)。推导了Y辐照下,树脂界面竞争动力学公式。假设激发水分子引起了树脂磺酸基团的辐射水解,求得了抑制剂与H_1O~*作用相对速率常数之比。 k_(NO_3~-+H_2O~*:kc_(2H_5 OH+H_2O~*:k_(AC~-1+H_2O~*:k_(Cl~-1,Br~(-1)+H_2O~*:k_1~(-1)+H_2O~*=1:0.53:0.46:0.25:0.07.
In this paper, the protective effects of X ~ (-1), Ac ~ (-1), NO_3 ~ -1, C_2H_5OH and other solutions on styrene sulfonic acid resin were studied. The order of inhibiting the sulfonic acid radical irradiation was NO_3 ~ 1> C_2_5OH > Ac ~ (-1)> C1 ~ (-1), Br ~ (-1)> Ⅰ ~ (-1). The acidity of the solution significantly affected the protective effect of halogen ions on the sulfonic acid resin. In acid medium, the addition of iodine could restrain the additional radiolysis of resin to water. However, in the neutral solution, Ⅰ ~ (-1) Inhibition, and the order of Br ~ (-1), Cl ~ (-1)> Ⅰ ~ (-1). The kinetic equation of resin interfacial competition was deduced under Y irradiation. Assuming that the excited water molecule causes the radiation hydrolysis of the resin sulfonate groups, the ratio of the relative rate constant of the inhibitor to the H 1 O ~ * action is found. k_ (NO_3 ~ + H_2O ~ *: kc_ (2H_5 OH + H_2O ~ *: k_ (AC ~ -1 + H_2O ~ *: (-1) + H_2O ~ * = 1: 0.53: 0.46: 0.25: 0.07.