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讨论了如何选择适当的规则 ,如何建立简洁实用的规则库 ,如何应用规则库 .提出了四种主要的光学邻近矫正规则 ,在实验结果中列举了规则库中的部分数据 .利用规则矫正后的版图光刻得到的硅片图形有了明显的改善 .规则库的自动建立部分 (OPCL)是基于规则的光学邻近矫正系统的重要组成部分 .
Discusses how to choose the appropriate rules, how to build a concise and practical rule base, and how to use the rule base.Four main rules of optical proximity correction are proposed, and part of the data in the rule base is listed in the experimental results.Using the rule-corrected Significant improvements have been made in the lithographic patterning of the lithography. The OPCL is an important part of the rules-based optical proximity correction system.