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以马赫泽德干涉光路结构为基础,采用电光材料的光学相控技术产生用于光学形貌测量的干涉投影条纹。为了研究电光晶体作为光学相控器件的相位调制误差对干涉条纹质量的影响,建立了电光晶体对干涉条纹质量的模型,分析晶体折射率、平面度与波前调制的关系及其对干涉条纹质量的影响。仿真结果表明,电光晶体调制误差会影响干涉条纹质量。理想平面度下晶体折射率的畸变会使干涉条纹变形,折射率离散化阶数直接影响投影条纹的高次谐波成分,甚至导致投影条纹严重失真;折射率理想的情况下,晶体平面度的差异也会造成干涉条纹不同程度的形变。
Based on the Mach-Zehnder interference optical path structure, an optical phase-control technique using electro-optical materials is used to generate interference projection fringes for optical appearance measurement. In order to study the effect of phase modulation error of electro-optic crystal as an optical phase-control device on the quality of interference fringes, a model of electro-optic crystal for interference fringes was established. The relationship between refractive index, flatness and wavefront modulation Impact. Simulation results show that the modulation error of electro-optic crystal will affect the quality of interference fringes. The distortion of the refractive index of the crystal under the ideal flatness will distort the fringes, and the order of the refractive index directly affects the harmonic components of the projection fringe and may even lead to serious distortion of the projection fringe. In the case of ideal refractive index, the crystal flatness Differences can also cause varying degrees of interference fringes deformation.