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目的比较不同抛光方法对钴铬合金离子析出的影响。方法本研究于2013年3—8月在福建医科大学附属口腔医院进行。制作30个钴铬合金试样,随机分为5组,分别为砂纸抛光组、镜面抛光组、橡皮轮抛光组、电解抛光组和化学抛光组,每组6个试样。根据ISO 10271:2011标准采用浸泡实验检测试样Co、Cr离子的析出情况。检测腐蚀前的表面粗糙度和腐蚀前后表面形貌。结果镜面抛光组Co、Cr析出量之和小于橡皮轮抛光组、电解抛光组和化学抛光组(P<0.05)。化学抛光组表面粗糙度最大(P<0.05)。化学抛光组Co、Cr析出量及其总和均大于砂纸抛光组、镜面抛光组、橡皮轮抛光组、电解抛光组(P<0.05)。扫描电镜观察表明,砂纸抛光组、橡皮轮抛光组、化学抛光组表面有明显的腐蚀痕迹。结论钴铬合金经镜面抛光可获得最好的表面形貌和抗腐蚀性能,化学抛光对钴铬合金表面形貌改善不大,其抗腐蚀性能最差。
Objective To compare the effects of different polishing methods on the ion precipitation of cobalt-chromium alloy. Methods The study was performed at the Affiliated Stomatological Hospital of Fujian Medical University from March to August in 2013. 30 samples of cobalt-chromium alloy were made and randomly divided into 5 groups, which were sandpaper polishing group, mirror polishing group, rubber wheel polishing group, electrolytic polishing group and chemical polishing group, each group had 6 samples. According to the standard of ISO 10271: 2011, the soaking test was used to test the precipitation of Co and Cr ions. Pre-corrosion surface roughness and corrosion before and after the surface morphology. Results The sum of the deposition amount of Co and Cr in the mirror polishing group was smaller than that of the rubber wheel polishing group, the electrolytic polishing group and the chemical polishing group (P <0.05). The surface roughness of the chemical polishing group was the largest (P <0.05). The amount of Co and Cr precipitated in the chemical polishing group and its total amount were greater than that of the sandpaper polishing group, the mirror polishing group, the rubber wheel polishing group and the electrolytic polishing group (P <0.05). Scanning electron microscopy showed that the sandpaper polishing group, the rubber wheel polishing group, chemical polishing group surface obvious signs of corrosion. Conclusions The best surface morphology and corrosion resistance of cobalt-chromium alloy can be obtained by mirror polishing. Chemical polishing can not improve the surface morphology of cobalt-chromium alloy, and its corrosion resistance is the worst.